Sampling pitch is
A) the distance between laser beam positions during processing of the plate
B) the distance between adjacent detector elements
C) how digital detectors sample the x-ray exposure
D) all of the above
Correct Answer:
Verified
Q40: The scintillator for the indirect capture DR
Q42: Postprocessing functions
A)allow changes to be made in
Q44: The range of exposure intensities that an
Q44: For CR systems, the exposure index is
Q47: As the pixel size decreases, the spatial
Q48: As the matrix size increases, the pixel
Q48: Digital imaging preprocessing includes
A)rescaling
B)histogram analysis
C)A and B
D)none
Q53: The range of exposures that produce acceptable
Q59: In CR, this represents the exposure level
Q60: The useful imaging area of the digital
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