The amount of filtration required to reduce the exposure of the beam to half of its original intensity is defined as:
A) wedge filtration.
B) HVL.
C) mAs compensator.
D) TVL.
Correct Answer:
Verified
Q18: mA is a measure of _ that
Q19: What is the name of the device
Q20: _ is the phenomenon that occurs around
Q21: The advantage to having a focal track
Q22: A dual-focus tube has two:
A) cathode filaments.
B)
Q24: The device that nearly surrounds the filament
Q25: _ envelopes are more commonly used in
Q26: Diagnostic x-ray exposures range from:
A) 15 to
Q27: Tungsten has a _ atomic number and
Q28: The speed the electrons inside the x-ray
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