A silicon dioxide film formed on the surface of a silicon wafer by thermal oxidation has a thickness that is
A)greater than,
B)less than
C)the same as the layer of substrate silicon used to form it.

Name: A silicon dioxide film formed on the surface of a silicon wafer by thermal oxidation has a thickness that is A)greater than, B)less than C)the same as the layer of substrate silicon used to form it.
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Question

Quizplus · Accepted Answer

to grow a sio₂ film of thickness d requires a layer of silicon that is 0.44d thick.

A Silicon Dioxide Film Formed on the Surface of a Silicon