Which of the following are doping processes in IC fabrication (two best answers):
A)chemical vapor deposition,
B)diffusion
C)ion implantation
D)physical vapor deposition
E)plasma etching
F)thermal oxidation
G)wet etching

Question

Quizplus · Accepted Answer

Diffusion and ion implantation are both doping processes used in IC fabrication. Diffusion involves the introduction of dopant atoms into a semiconductor material by heating it in the presence of the dopant. Ion implantation involves the acceleration of dopant ions into the semiconductor material.

Which of the Following Are Doping Processes in IC Fabrication