Which etching process produces the more anisotropic etch in IC fabrication:
A)plasma etching
B)wet chemical etching

Question

Quizplus · Accepted Answer

Plasma etching is known for producing more anisotropic etches, which means the etching process is directional, allowing for the creation of more precise and defined patterns on the substrate. Wet chemical etching, on the other hand, tends to be isotropic, etching in all directions equally.

Which Etching Process Produces the More Anisotropic Etch in IC